发明名称 METHOD OF MANUFACTURING POROUS FLUORORESIN THIN FILM AND POROUS FLUORORESIN THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a porous fluororesin thin film which enables uniform and large drawing even when the thickness of the thin film is 50μm or smaller and manufacture of a porous fluororesin thin film having uniform and fine pores with a high porosity, and the porous fluororesin thin film having such excellent characteristics. SOLUTION: The method of manufacturing a porous fluororesin thin film comprises fixing a fluororesin thin film based on polytetrafluoroethylene and having a film thickness of 50μm or smaller to a support having a characteristic of extending on drawing and drawing the fluororesin thin film at a temperatures below 30°C to make porous the fluororesin thin film. The porous fluororesin thin film which is made porous by fixing a fluororesin thin film based on a polytetrafluoroethylene and having a Gurley second of 5,000 or larger to a support having a characteristic of extending on drawing and drawing to make porous the fluororesin thin film and has a film thickness below 50μm and a mean flow pore of 45 nm or smaller is also provided. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010094579(A) 申请公布日期 2010.04.30
申请号 JP20080265387 申请日期 2008.10.14
申请人 SUMITOMO ELECTRIC FINE POLYMER INC 发明人 HAYASHI FUMIHIRO;HAYASAKI TOSHIKATSU;KANAZAWA SHINICHI;FURUMOTO ITSUCHIKA;NIBU MASATO
分类号 B01D71/36;B01D69/10;C08J9/00 主分类号 B01D71/36
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