发明名称 |
METHOD OF MANUFACTURING POROUS FLUORORESIN THIN FILM AND POROUS FLUORORESIN THIN FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a porous fluororesin thin film which enables uniform and large drawing even when the thickness of the thin film is 50μm or smaller and manufacture of a porous fluororesin thin film having uniform and fine pores with a high porosity, and the porous fluororesin thin film having such excellent characteristics. SOLUTION: The method of manufacturing a porous fluororesin thin film comprises fixing a fluororesin thin film based on polytetrafluoroethylene and having a film thickness of 50μm or smaller to a support having a characteristic of extending on drawing and drawing the fluororesin thin film at a temperatures below 30°C to make porous the fluororesin thin film. The porous fluororesin thin film which is made porous by fixing a fluororesin thin film based on a polytetrafluoroethylene and having a Gurley second of 5,000 or larger to a support having a characteristic of extending on drawing and drawing to make porous the fluororesin thin film and has a film thickness below 50μm and a mean flow pore of 45 nm or smaller is also provided. COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010094579(A) |
申请公布日期 |
2010.04.30 |
申请号 |
JP20080265387 |
申请日期 |
2008.10.14 |
申请人 |
SUMITOMO ELECTRIC FINE POLYMER INC |
发明人 |
HAYASHI FUMIHIRO;HAYASAKI TOSHIKATSU;KANAZAWA SHINICHI;FURUMOTO ITSUCHIKA;NIBU MASATO |
分类号 |
B01D71/36;B01D69/10;C08J9/00 |
主分类号 |
B01D71/36 |
代理机构 |
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