RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING SAME

摘要

A resist pattern coating agent which contains a resin having a hydroxy group, and a solvent containing not less than 30% by mass of a branched alkyl alcohol having 3-10 carbon atoms.  The resist pattern coating agent is used in the step (2) of a resist pattern forming method which comprises: a step (1) wherein a first resist pattern is formed on a substrate using a first radiation-sensitive resin composition; a step (2) wherein the first resist pattern is processed with a resist pattern coating agent; and a step (3) wherein a second resist pattern is formed on the substrate, which has been processed with the resist pattern coating agent, using a second radiation-sensitive resin composition.