发明名称 APPARATUS FOR CLEANING SUBSTRATE FOR MAGNETIC RECORDING MEDIUM, AND METHOD FOR CLEANING SUBSTRATE FOR MAGNETIC RECORDING MEDIUM
摘要 <p>Provided are an apparatus and a method for cleaning a substrate for a magnetic recording medium, wherein a cleaning solution does not easily scatter to surrounding areas, and a substrate which is for a magnetic recording medium and applicable to low floating of a magnetic head above a magnetic recording surface and has high cleanliness is obtained.  The apparatus for cleaning a substrate (1) for a magnetic recording medium is provided with: a cleaning solution nozzle (4) which supplies the cleaning solution onto the substrate (1); a cleaning tool (3) composed of a porous material; a sliding means which slides the cleaning tool (3) on the substrate (1); and a cleaning solution discharging means (7) which sucks and discharges the cleaning solution from over the substrate (1) through the cooling tool (3).</p>
申请公布号 WO2010047119(A1) 申请公布日期 2010.04.29
申请号 WO2009JP05556 申请日期 2009.10.22
申请人 SHOWA DENKO K.K.;SAKAGUCHI, RYUJI;UEDA, MANABU;KITAZAWA, YUJI 发明人 SAKAGUCHI, RYUJI;UEDA, MANABU;KITAZAWA, YUJI
分类号 G11B5/84;B08B1/04;B08B5/04 主分类号 G11B5/84
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