| 摘要 |
PURPOSE: A pellicle frame surface processing method is provided to improve the surface hardness of an oxide film, and to obtain an accuracy of a wafer product by coating the oxide film on a pellicle frame. CONSTITUTION: A pellicle frame surface processing method comprises the following steps: hanging a pellicle frame to a jig; dipping the pellicle frame to an electrolyte using the jig; and forming an oxide film using a plasma electrolysis on the surface of the pellicle frame dipped in the electrolyte. The pellicle frame is aluminum 7075. The oxide film is coated in black.
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