发明名称 POLISHING PAD SEASONING METHOD, SEASONING PLATE, AND SEMICONDUCTOR POLISHING DEVICE
摘要 A seasoning plate is placed on a polishing pad and performs seasoning of the polishing pad by abrading the polishing pad through the friction caused by rotation of the polishing pad. The seasoning plate includes: conditioners that abrade the polishing pad; a round flexible substrate that has the conditioners attached to the lower face thereof; an O-ring that is placed on the upper face of the flexible substrate, the O-ring forming a circle concentric with the flexible substrate; and a weight plate serving as a weight portion that is placed on the O-ring and applies weight for deforming the flexible substrate.
申请公布号 US2010105295(A1) 申请公布日期 2010.04.29
申请号 US20090607259 申请日期 2009.10.28
申请人 SUMCO TECHXIV CORPORATION 发明人 MARUOKA DAISUKE;MOROIWA KOUDAI
分类号 B24B1/00;B24B53/017;B24B53/12;H01L21/304 主分类号 B24B1/00
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