| 摘要 |
<p>Provided is a charged particle beam apparatus wherein an inspecting position (wafer coordinate system) of a sample to be tested is converted into an arrangement position (stage coordinate system (polar coordinate system)) of an inspecting mechanism, a rotating arm (102, 1012) is rotated, and a rotating stage (103, 1011) is rotated, thereby the inspecting position of the sample to be tested is moved to the arrangement position of the inspecting mechanism. At this time, on the moving track of the rotating stage center drawn by rotation of the rotating arm, a plurality of inspecting apparatuses are arranged. Furthermore, a function of calculating and correcting a center shift quantity of the rotating stage and the like is provided. Thus, inspection accuracy of the charged particle beam apparatus having the biaxial rotating stage mechanism is improved, and the small-sized charged particle beam apparatus wherein stage control is facilitated is provided.</p> |
