发明名称 |
Method And Apparatus For Inspecting A Pattern Formed On A Substrate |
摘要 |
A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.
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申请公布号 |
US2010104173(A1) |
申请公布日期 |
2010.04.29 |
申请号 |
US20090649898 |
申请日期 |
2009.12.30 |
申请人 |
YOSHIDA MINORU;MAEDA SHUNJI;SHIMODA ATSUSHI;SAKAI KAORU;OKABE TAKAFUMI;WATANABE MASAHIRO |
发明人 |
YOSHIDA MINORU;MAEDA SHUNJI;SHIMODA ATSUSHI;SAKAI KAORU;OKABE TAKAFUMI;WATANABE MASAHIRO |
分类号 |
G06K9/62;G01N21/956;G03F7/20;G03F9/00 |
主分类号 |
G06K9/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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