发明名称 |
DYNAMIC MULTI-PURPOSE COMPOSITION FOR THE REMOVAL OF PHOTORESISTS |
摘要 |
Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt. % water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided. Advantageous solution methods are provided for the use of the novel stripper solutions to prepare an electronic interconnect structure by removing a plurality of resist layers to expose an underlying dielectric and related substrate without imparting damage to any of the underlying structure.
|
申请公布号 |
US2010104824(A1) |
申请公布日期 |
2010.04.29 |
申请号 |
US20070446600 |
申请日期 |
2007.04.06 |
申请人 |
PHENIS MICHAEL T;CHAN RAYMOND;POLLARD KIMBERLY DONA |
发明人 |
PHENIS MICHAEL T.;CHAN RAYMOND;POLLARD KIMBERLY DONA |
分类号 |
B32B5/00;B08B3/08;B08B5/00;C11D1/835 |
主分类号 |
B32B5/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|