| 发明名称 |
SEMICONDUCTOR DEVICE |
| 摘要 |
A method of fabricating a semiconductor device includes depositing a mask of low melting point material on a surface of the semiconductor device; depositing a layer to be structured relative to the mask; and removing the mask of low melting point material.
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| 申请公布号 |
US2010102422(A1) |
申请公布日期 |
2010.04.29 |
| 申请号 |
US20080256646 |
申请日期 |
2008.10.23 |
| 申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
BEER GOTTFRIED;MENGEL MANFRED |
| 分类号 |
H01L23/495;H01L21/311;H01L21/50;H01L21/60 |
主分类号 |
H01L23/495 |
| 代理机构 |
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