发明名称 CHARGED PARTICLE BEAM APPARATUS
摘要 A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.
申请公布号 US2010102224(A1) 申请公布日期 2010.04.29
申请号 US20090651209 申请日期 2009.12.31
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 TAKANE ATSUSHI;IKEDA MITSUJI;YAMAGUCHI SATORU;OZAWA YASUHIKO
分类号 G01N23/00 主分类号 G01N23/00
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