发明名称 |
CHARGED PARTICLE BEAM APPARATUS |
摘要 |
A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.
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申请公布号 |
US2010102224(A1) |
申请公布日期 |
2010.04.29 |
申请号 |
US20090651209 |
申请日期 |
2009.12.31 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
TAKANE ATSUSHI;IKEDA MITSUJI;YAMAGUCHI SATORU;OZAWA YASUHIKO |
分类号 |
G01N23/00 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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