发明名称 ROTATABLE SPUTTER TARGET BACKING CYLINDER, ROTATABLE SPUTTER TARGET, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, AND COATING INSTALLATION
摘要 <p>A rotatable target device for sputtering installations, the rotatable target device including: a rotatable target base (4) adapted for holding a solid target cylinder (5), the solid target cylinder having an inner axial face (54), an outer axial face (55) and at least one front face (56) connecting the inner axial face with the outer axial face; wherein the rotatable target base comprises a flexible element (23; 230), a first face (3) adapted to the shape of the inner axial face of the solid target cylinder and a second face (250; 81) adapted to hold the flexible element outside of the solid target cylinder.</p>
申请公布号 WO2010046486(A1) 申请公布日期 2010.04.29
申请号 WO2009EP64014 申请日期 2009.10.23
申请人 APPLIED MATERIALS, INC.;SCHAEFER, MICHAEL;TRASSL, ROLAND;LIU, JIAN 发明人 SCHAEFER, MICHAEL;TRASSL, ROLAND;LIU, JIAN
分类号 H01J37/34;C23C14/34 主分类号 H01J37/34
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