发明名称 |
COMPOSITION FOR ANTIREFLECTION FILM FORMATION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION |
摘要 |
A composition for forming an anti-reflection film for use in forming an anti-reflection film on a resist film is provided, the composition for forming an anti-reflection film being easily handled, and capable of forming an anti-reflection film having superior optical characteristics similarly to anti-reflection films formed using PFOS. A composition for forming an anti-reflection film to be provided on a resist film which includes a certain fluorine compound. This composition for forming an anti-reflection film can form an anti-reflection film having superior optical characteristics since the certain fluorine compound contributes to improvement of the optical characteristics of the anti-reflection film.
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申请公布号 |
US2010104987(A1) |
申请公布日期 |
2010.04.29 |
申请号 |
US20080451747 |
申请日期 |
2008.05.16 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
SAWANO ATSUSHI;KOSHIYAMA JUN;HIROSAKI TAKAKO |
分类号 |
G03F7/11;C09D101/00;C09D133/02 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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