| 发明名称 |
SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING INSTALLATION |
| 摘要 |
<p>A semiconductor device manufacturing method is provided, including: providing a semiconductor substrate (14), forming on the semiconductor substrate a layer (20) including a semiconductor compound and a dope additive (22), and thereafter forming an emitter region (30) and gettering impurities (16) by annealing the semiconductor substrate including the layer.</p> |
| 申请公布号 |
WO2010046284(A1) |
申请公布日期 |
2010.04.29 |
| 申请号 |
WO2009EP63370 |
申请日期 |
2009.10.13 |
| 申请人 |
APPLIED MATERIALS, INC.;FERRE I TOMAS, RAFEL |
发明人 |
FERRE I TOMAS, RAFEL |
| 分类号 |
H01L31/18 |
主分类号 |
H01L31/18 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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