发明名称 |
Imprint Lithography Template |
摘要 |
Systems, methods, and processes for forming imprint lithography templates from a multi-layer substrate are described. The multi-layer substrate may include a block copolymer layer positioned on a substrate layer. The block copolymer layer may include two or more domains. At least one domain may have a different composition sensitivity than another domain such that the domains have different reactions to a specific process. Reaction of the domains to the specific process may provide a pattern in the block copolymer layer. The pattern may be transferred into the substrate layer to form the imprint lithography template.
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申请公布号 |
US2010102029(A1) |
申请公布日期 |
2010.04.29 |
申请号 |
US20090604866 |
申请日期 |
2009.10.23 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
SCHMID GERARD M.;RESNICK DOUGLAS J.;SREENIVASAN SIDLGATA V.;XU FRANK Y. |
分类号 |
B44C1/22;B05D5/00;B32B37/02 |
主分类号 |
B44C1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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