发明名称 GAS ENVIRONMENT FOR IMPRINT LITHOGRAPHY
摘要 Non-uniformity may be minimized by reducing or eliminating non-uniform evaporation of a viscous liquid disposed on the surface of a substrate. At least one gas source component and one vacuum component may provide a mass flow rate of gas across the surface of the substrate to reduce or eliminate non-uniform evaporation.
申请公布号 WO2010047755(A2) 申请公布日期 2010.04.29
申请号 WO2009US05666 申请日期 2009.10.19
申请人 MOLECULAR IMPRINTS, INC. 发明人 LU, XIAOMING
分类号 G03F7/00 主分类号 G03F7/00
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