PLASMA PROCESSING APPARATUS

摘要

PURPOSE: A plasma processing apparatus is provided to reduce a manufacturing time by cleaning the bevel region and the lower side of the substrate in one chamber. CONSTITUTION: A substrate blocking unit protects the upper side of a substrate and sprays a first processing gas to the upper side of the substrate. A substrate support unit(200) supports the lower side of the substrate and sprays a second process gas to the lower side of the substrate. A substrate lift(600) includes a support ring(610). The support ring supports the edge of the substrate for elevating the substrate.