| 摘要 |
A silane deposition monitoring system (30) includes a silane deposition sensor (32) and a plasma field receptor (18). A method of monitoring silane deposition in a plasma processing apparatus includes placing the silane deposition sensor (32) within a processing vessel (12) in proximity with the plasma field receptor (18) and optically assessing the silane deposition sensor (32) for silane during or following plasma silanization. |
