摘要 |
SiHaXb, wherein X is a halogen, a and b are O or an integer from 1 to 4 and the sum of a + b is 4, is purified by contact with free bromine or iodine to form high boiling point halogen-impurity compounds which are then separated. Separation may be effected by distillation. The impurities may be arsenic, phosphorus, boron, and/or sulphur. The process conditions are not critical, other than that the contact is effected at a temperature below the decomposition temperature of the silicon-containing material, preferably at its boiling point, so that it can be continuously removed by distillation from the halogen-impurity compounds which remain in the residue. Distillation at atmospheric pressure is preferably employed. Elemental bromine, or iodine, or alternatively, halogen-containing compounds which release either one of them, e.g. potassium iodide, may be used. The use of an excess of free iodine or bromine is preferred. In a typical example, trichlorosilane containing 200 p.p.b. (parts per billion) As and 9 p.p.b. P was distilled at atmospheric pressure at 32 DEG C. in a quartz column having one theoretical distillation plate. Iodine crystals were added to the distillate, which was redistilled. Separation of the halogen-impurity compounds may also be effected by selective adsorption or differential diffusion through a membrane or porous medium. Silicon may be produced from the purified silicon-containing compounds by thermal decomposition. The silicon and purified silicon-containing compounds may contain less then 1 p.p.b. As and less than 1 p.p.b. P.ALSO:As and P impurites in a sample of SiHaXb (where X is halogen, a and b are 0-4 and a+b=4) are analysed by separating the high boiling halogen-impurity compounds from the sample and determining the amount of As and P in said compounds e.g. colorimetrically. The SiHaXb is contacted with free bromine or iodine to form the high boiling point halogen impurity compounds which are then separated e.g. by distillation, selective adsorption or differential diffusion through a membrane or porous medium (see Division C1). Elemental bromine or iodine, or halogen-containing compounds which release either one of them. e.g. KI, may be used. |