发明名称 |
Optical element manufacturing method, optical element, Nipkow disk, confocal optical system and 3-D measurement device |
摘要 |
An optical element manufacturing method includes: disposing a light-shielding layer (14) that includes at least an Si layer as an uppermost layer, on a substrate (12) used as a base member, forming an optical aperture (14a) at the light-shielding layer (14) and forming a fine recession/projection structure (MR) at a surface of the uppermost layer through dry etching.
|
申请公布号 |
US7704402(B2) |
申请公布日期 |
2010.04.27 |
申请号 |
US20050666076 |
申请日期 |
2005.10.24 |
申请人 |
NIKON CORPORATION |
发明人 |
HAMAMURA YUTAKA;KADOMATSU KIYOSHI;AMEMIYA NOBORU |
分类号 |
C03C15/00;B44C1/22 |
主分类号 |
C03C15/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|