发明名称 Method of manufacturing conductive pattern and electronic device, and electronic device
摘要 The manufacturing method includes forming a molecular film 16 of at least one kind of molecule on a part of a conductive film 13 by placing, on the conductive film 13, a solution 12 containing the one kind of molecule dissolved therein, with the one kind of molecule being selected from the group consisting of: a molecule expressed by Formula (1): CF3(CF2)n(CH2)mSH, where n indicates a natural number of 3 to 7 while m denotes a natural number of 8 to 18; and a molecule expressed by Formula (2): CF3(CF2)p(CH2)qSS(CH2)q′(CF2)p′CF3, where p and p′ each are a natural number of 3 to 7 independently while q and q′ each are a natural number of 8 to 18 independently. Subsequently, the conductive film 13 located in a part where the molecular film 16 has not been formed is removed by bringing the conductive film 13 into contact with an etchant for the conductive film 13. Thus, a conductive pattern 17 is formed.
申请公布号 US7704783(B2) 申请公布日期 2010.04.27
申请号 US20050599131 申请日期 2005.10.14
申请人 PANASONIC CORPORATION 发明人 NAKAGAWA TOHRU
分类号 H01L51/40 主分类号 H01L51/40
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