| 摘要 |
<p>PURPOSE: A sulfonium salt containing polymerizable anions are provided to cut an acid-labile group among chemically amplified resist composition and to ensure high resolution, dense dependability, and excellent exposure margin. CONSTITUTION: A sulfonium salt of a general formula(1), wherein R1 is hydrogen, fluorine, methyl or trifluoromethyl, R2, R3 and R4 are each independently a substituted or unsubstituted, straight or branched C1-C10 alkyl, alkenyl or oxoalkyl group or a substituted or unsubstituted C6-C18 aryl, aralkyl or aryloxoalkyl group, or at least two of R2, R3 and R4 may bond together to form a ring with the sulfur atom, A is a divalent C2-C20 hydrocarbon group of cyclic structure which may contain a heteroatom, and n is 0 or 1.</p> |
