SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to improve process yield by preventing a substrate from going out of a right position. CONSTITUTION: A chamber(110) has a path for moving a substrate and provides an inner space for processing the substrate. A support unit(120) is installed inside the chamber and supports the substrate. The chamber includes an exhaust hole(112) and an auxiliary exhaust hole. The exhaust hole is formed on the bottom of the chamber and exhausts the inside of the chamber. The auxiliary exhaust hole is formed on the path and exhausts the inside of the chamber.