| 摘要 |
PURPOSE: A method for manufacturing a display apparatus is provided to reduce a coffee ring effect generated by a pattern by planarizing a surface of the pattern by CMP(chemical mechanical polishing) process. CONSTITUTION: Ink solution is sprayed by using an ink-jet(10). Heat is applied to area which ink solution is sprayed by a heat treatment process. A pattern is formed by evaporation of a dispersion solvent of the ink solution(20). A surface of the pattern is planarized by using CMP(chemical mechanical polishing) process(30). Particles are inhaled by CMP process(40). |
