发明名称 |
APPARATUS FOR SUPPLYING TREATMENT LIQUID |
摘要 |
PURPOSE: A process solution supply device is provided to compensate for a temperature of the process solution with high temperature by installing a heating coil in a supply line. CONSTITUTION: A supply line supplies a process solution with high temperature suitable for a process condition to a nozzle. A temperature sensor(112) is installed between the supply line and the nozzle and measures the temperature of the process solution. A heating coil(110) is installed on the outer circumference of the supply line and controls the temperature of the process solution. A controller(102) controls the heating coil to make the temperature of the process solution suitable for a process condition corresponding to the temperature of the process solution from a temperature sensor.
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申请公布号 |
KR20100042870(A) |
申请公布日期 |
2010.04.27 |
申请号 |
KR20080102064 |
申请日期 |
2008.10.17 |
申请人 |
SEMES CO., LTD. |
发明人 |
LEE, JU DONG;SEO, JAE HEE |
分类号 |
H01L21/302;H01L21/304 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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