发明名称 APPARATUS FOR SUPPLYING TREATMENT LIQUID
摘要 PURPOSE: A process solution supply device is provided to compensate for a temperature of the process solution with high temperature by installing a heating coil in a supply line. CONSTITUTION: A supply line supplies a process solution with high temperature suitable for a process condition to a nozzle. A temperature sensor(112) is installed between the supply line and the nozzle and measures the temperature of the process solution. A heating coil(110) is installed on the outer circumference of the supply line and controls the temperature of the process solution. A controller(102) controls the heating coil to make the temperature of the process solution suitable for a process condition corresponding to the temperature of the process solution from a temperature sensor.
申请公布号 KR20100042870(A) 申请公布日期 2010.04.27
申请号 KR20080102064 申请日期 2008.10.17
申请人 SEMES CO., LTD. 发明人 LEE, JU DONG;SEO, JAE HEE
分类号 H01L21/302;H01L21/304 主分类号 H01L21/302
代理机构 代理人
主权项
地址