发明名称 PLASMA DEPOSITION APPARATUS
摘要 <p>Apparatus (10) for coating a surface of an article (14) with a thin film polymer layer by plasma deposition, the apparatus comprising: a plurality of processing chambers (12a, 12b, 12c....12n) into each of which one or more articles can be placed; means (18, 19, 20, 21, 22) for supplying an active species to said processing chambers for forming a plasma in said chambers; a plurality of induction means (24) associated with respective processing chambers, each induction means being operable to induce an electrical field internally of an associated processing chamber for forming a plasma when said active species is supplied thereto so that a surface of said article can be coated with a thin film polymer layer by plasma deposition; means (26) for providing a time varying electric current in the induction means; and pressure control means (28) for selectively controlling pressure in said processing chambers such that pressure in any one or more of said chambers can be controlled independently of pressure in other of said chambers.</p>
申请公布号 KR20100043070(A) 申请公布日期 2010.04.27
申请号 KR20107003088 申请日期 2008.07.17
申请人 P2I LTD. 发明人 COULSON STEPHEN RICHARD;KING CHARLES EDMUND
分类号 H05H1/36;H05H1/34 主分类号 H05H1/36
代理机构 代理人
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