| 发明名称 |
STAGE FOR UTRAVIOLATE NANO IMPRINT DEVICE |
| 摘要 |
<p>PURPOSE: A substrate alignment stage for a UV nano imprint device is provided to minimize the change of a substrate by uniformly distributing an adsorption nozzle along the edge of an alignment stage when fixing the substrate on an adsorption plate. CONSTITUTION: An adsorption plate(10) has a flat upper side in which a substrate is received. A vacuum hole(12) is formed on the upper side of the adsorption plate and is connected to a vacuum exhaust pipe through a vacuum path formed inside the absorption plate. An adsorption nozzle(14) is recessed on the upper side of the adsorption plate from the vacuum hole exposed to the upper side of the adsorption plate and forms vacuum pressure for vacuum adsorption of the substrate between the substrate received in the adsorption plate and the adsorption plate.</p> |
| 申请公布号 |
KR20100042113(A) |
申请公布日期 |
2010.04.23 |
| 申请号 |
KR20080101251 |
申请日期 |
2008.10.15 |
| 申请人 |
KOOKMIN UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION |
发明人 |
YIM, HONG JAE;SHIN, DONG HOON;KIM, WOO SONG;PARK, KYUNG SEO |
| 分类号 |
H01L21/683;H01L21/027;H01L21/687 |
主分类号 |
H01L21/683 |
| 代理机构 |
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代理人 |
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