APPARATUS FOR TREATING A SUBSTRATE

摘要

PURPOSE: An apparatus for treating a substrate is provided to reduce a time for cleaning a substrate while saving the amount of deionized water in cleaning the substrate after processing the substrate with a liquid agent. CONSTITUTION: An apparatus for treating a substrate comprises a substitution cleaning unit. The substitution cleaning unit(2) includes a transposition cleaning room, a conveyance roller, an entry nozzle(16), a high pressure nozzle(18) and an air nozzle(22). A transposition cleaning room is shorter length than the size of a substrate in transfer direction of the substrate. The conveyance roller transfers the substrate in the transposition cleaning room to one direction continuously.