发明名称 SILICON PARTS FOR PLASMA REACTION CHAMBERS
摘要 Silicon parts of a semiconductor processing apparatus containing low levels of metal impurities that are highly mobile in silicon are provided. The silicon parts include, for example, rings, electrodes and electrode assemblies. The silicon parts can reduce metal contamination of wafers processed in plasma atmospheres.
申请公布号 KR100954711(B1) 申请公布日期 2010.04.23
申请号 KR20047016282 申请日期 2003.03.21
申请人 发明人
分类号 H01L21/3065;H01L21/02;H01L21/205 主分类号 H01L21/3065
代理机构 代理人
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