| 摘要 |
PURPOSE: A thin film forming an apparatus on a film is provided to reduce a manufacturing process by performing out-gassing of a film, film deposition, and crystallization of the deposited film successively. CONSTITUTION: A thin film forming device(1) comprises an out-gassing chamber(10), deposition chambers(30, 50), and a crystallization chamber(70). The out-gassing chamber out-gasses a target film(F0). The deposition chamber is arranged to be adjacent to the out-gassing member and forms a thin film on the target film. The crystallization chamber is adjacent to the deposition chamber and makes the target film crystal.
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