UV NANO IMPRINT LITHOGRAPHY DEVICE WITH A TEMPERATURE CONTROL FUNCTION AND METHOD OF TEMPERATURE CONTROLLING SAME

摘要

PURPOSE: A UV nano implant lithography device with a temperature control function and a temperature control method are provided to improve accuracy of a pattern by minimizing thermal expansion difference between a mold and a substrate due to heating of a polymer resin. CONSTITUTION: A thermocouple and a heating line are installed on a thermostat plate. A chamber(4) receives a loading plate, a thermostat plate, and a pressure unit in a receiving space which is opened through a door. A temperature sensor(5) is installed inside the chamber to measure an inner temperature of the chamber. An external air handing unit constantly maintains the inner temperature of the chamber by circulating the air inside a chamber. A control board controls the operation of the external air handing unit and controls the temperature of the thermostat plate based on temperature data measured by a thermo couple and a temperature sensor.