| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive type resist composition capable of showing an excellent lithography characteristic and forming a resist pattern of a favorable shape, a resist pattern forming method, using the positive type resist composition, and a new high molecular compound useful as a base material component of the positive type resist composition. <P>SOLUTION: The positive type resist composition includes a base material component (A) increased in solubility to an alkali liquid developer by the action of an acid and an acid generating agent component (B) caused to generate the acid by exposure. The base material component (A) contains a high molecular compound (A1) having a structural unit (a0) having a norbornane lactone structure at a side chain and a structural unit (a2) not corresponding to the structural unit (a0) and derived from acrylic ester containing a lactone-contained cyclic group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
