发明名称 LASER ANNEALING METHOD AND LASER ANNEALING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a laser annealing method uniformly crystallizing an amorphous film in laser annealing which is carried out by radiating a laser beam while scanning. SOLUTION: The laser annealing method includes the steps of: radiating a laser beam to an amorphous film on a substrate 10 while scanning the laser beam, to crystallize the amorphous film; obtaining a scanning speed by detecting a light quantity of laser beam reflected from the substrate 10 by a reflected light quantity detector PD and a scanning position of the laser beam by a reflected light position detector PSD, while the radiation and the scanning of the laser beam are carried out; and controlling a radiation level and the scanning speed of the laser beam based on results of comparison of the light quantity of laser beam reflected and the scanning speed of the laser beam with respective preset references, in a control portion 30. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010093159(A) 申请公布日期 2010.04.22
申请号 JP20080263561 申请日期 2008.10.10
申请人 SONY CORP 发明人 TAKAGI KATSUJI;MACHIDA AKIO;FUJINO TOSHIO;KONO MASAHIRO;FUKAZAWA YOSHIO;HAGA SHINSUKE
分类号 H01L21/20;H01L21/268 主分类号 H01L21/20
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