| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system and a method utilizing a dynamic optical system which is adjustable, possibly automatically adjustable in response to measured or detected characteristics of an illumination beam and/or patterned beam, wherein the system and method do not affect throughput during correction and/or do not disturb other optical characteristics. <P>SOLUTION: The system includes: an illumination system 802 for forming a radiation beam; a patterning device 804 for patterning the radiation beam; a projection system 808 for projecting a patterned beam onto a target point of an object at an image plane; a feedback system 818 for detecting at least a part of the patterned beam projected on the image plane and forming a control signal according to the detection; an optical element which can be dynamically controlled; and a generator for generating an electric field to be applied to the optical element according to the control signal, wherein the electric field applied to the optical element changes a refractive index in at least one direction in the optical element. <P>COPYRIGHT: (C)2010,JPO&INPIT |
