发明名称 EXPOSURE HEAD AND IMAGE FORMING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a technique to achieve excellent exposure by suppressing variation of an imaging position without depending on deformation of a rod lens array, in such constitution that a substrate where a light emitting element is disposed and the rod lens array are fixed through a light transparent member. <P>SOLUTION: The exposure head includes the substrate 291 through which light from the light emitting elements E provided on a first surface 291-h of the substrate penetrates from the first surface 291-t to a second surface 291-h, the rod lens array 299 which is provided on the second surface 291-h side of the substrate 291 to image the light from the second surface 291-h, the light transparent member 297 which is provided between the substrate 291 and the rod lens array 299 and fixed to the second surface 291-h of the substrate 291 and the rod lens array 299, and a support member 295 which supports the first surface 291-t of the substrate 291. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010089299(A) 申请公布日期 2010.04.22
申请号 JP20080259369 申请日期 2008.10.06
申请人 SEIKO EPSON CORP 发明人 INOUE NOZOMI;ARAI YOSHIO;TSUJINO KIYOSHI
分类号 B41J2/44;B41J2/45;B41J2/455;H01L51/50 主分类号 B41J2/44
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