发明名称 |
SURFACE TREATMENT METHOD OF RESIST PATTERN AND RESIST PATTERN FORMING METHOD USING THE SURFACE TREATMENT METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface treatment method of a resist pattern which meets the requirement that the line width and LWR (Line Width Roughness) of a first resist pattern are not varied by the freezing of the first resist pattern and the formation of a second resist pattern in a double patterning method. <P>SOLUTION: The surface treatment method comprises bringing a resist pattern formed from a resin containing a specific lactone structure and a compound having two or more nucleophilic functional groups per molecule into a solid phase-gas phase reaction. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010091638(A) |
申请公布日期 |
2010.04.22 |
申请号 |
JP20080259039 |
申请日期 |
2008.10.03 |
申请人 |
FUJIFILM CORP |
发明人 |
KAMIMURA SATOSHI;TARUYA SHINJI;NISHIKAWA NAOYUKI;YOSHIDA YUKO |
分类号 |
G03F7/40;G03F7/039;H01L21/027 |
主分类号 |
G03F7/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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