发明名称 SURFACE TREATMENT METHOD OF RESIST PATTERN AND RESIST PATTERN FORMING METHOD USING THE SURFACE TREATMENT METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a surface treatment method of a resist pattern which meets the requirement that the line width and LWR (Line Width Roughness) of a first resist pattern are not varied by the freezing of the first resist pattern and the formation of a second resist pattern in a double patterning method. <P>SOLUTION: The surface treatment method comprises bringing a resist pattern formed from a resin containing a specific lactone structure and a compound having two or more nucleophilic functional groups per molecule into a solid phase-gas phase reaction. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010091638(A) 申请公布日期 2010.04.22
申请号 JP20080259039 申请日期 2008.10.03
申请人 FUJIFILM CORP 发明人 KAMIMURA SATOSHI;TARUYA SHINJI;NISHIKAWA NAOYUKI;YOSHIDA YUKO
分类号 G03F7/40;G03F7/039;H01L21/027 主分类号 G03F7/40
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