| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-sensitivity polymerizable composition which efficiently generates active radicals upon irradiation with an energy ray, and to further provide a negative resist material which cures at a very high rate, is suitably used for very clear pattern exposure or direct drawing, has excellent adhesion to a substrate, and is suitably used as a photoresist material. <P>SOLUTION: The polymerizable composition includes a specific oxime ester-based radical polymerization initiator (A), a radical-polymerizable compound (B), and an alkali-soluble resin. <P>COPYRIGHT: (C)2010,JPO&INPIT |
