发明名称 NEGATIVE-TYPE RESIST FOR FORMING PROTRUSION FOR LIQUID CRYSTAL ALIGNMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a negative-type resist for forming a protrusion for liquid crystal alignment that forms a protrusion for controlling the liquid crystal alignment of a liquid crystal display, and that prevents liquid crystal burn-in phenomenon from occurring in the manufactured liquid crystal display. <P>SOLUTION: This negative-type resist for forming the protrusion for liquid crystal alignment contains alkali-soluble resin, polymerization monomer and photopolymerization initiator, and is used for forming the protrusion for liquid crystal alignment of an MVA (Multidomain Vertical Alignment) type liquid crystal display device. The polymerization monomer contains novolac epoxy (meth) acrylate, with a weight average molecular weight range of 600-2,000. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010091982(A) 申请公布日期 2010.04.22
申请号 JP20080264476 申请日期 2008.10.10
申请人 SEKISUI CHEM CO LTD 发明人 KOBAYASHI HIROSHI
分类号 G02F1/1337;C08L33/14;C08L63/10;G03F7/027 主分类号 G02F1/1337
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