MULTIPLE PHASE RF POWER FOR ELECTRODE OF PLASMA CHAMBER

摘要

RF power is coupled with different phase offsets to different RF connection points (31- 34) on an electrode (20-26) of a plasma chamber. Preferably, the number of different RF connection points and corresponding phase offsets is at least four, and the positions of the RF connection points are distributed along two orthogonal dimensions (for example, X and Y axes) of the electrode. Preferably, power to each respective RF connection point is supplied by a respective RF power supply (41-44), wherein each power supply synchronizes its phase to a common reference RF oscillator (70).