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发明名称
EPITAKTISCHER SILIZIUMWAFER UND HERSTELLUNGSVERFAHREN UND SUBSTRAT FÜR EPITAKTISCHEN SILIZIUMWAFER
摘要
申请公布号
DE60043967(D1)
申请公布日期
2010.04.22
申请号
DE20006043967
申请日期
2000.01.26
申请人
SHIN-ETSU HANDOTAI CO. LTD.
发明人
HOSHI, RYOJI;SONOKAWA, SUSUMU;SAKURADA, MASAHIRO;OHTA, TOMOHIKO;FUSEGAWA, IZUMI
分类号
C30B29/06;C30B15/00;C30B15/20
主分类号
C30B29/06
代理机构
代理人
主权项
地址
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