| 发明名称 |
EXPOSURE APPARATUS, MAINTENANCE METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of suppressing an exposure defect. <P>SOLUTION: The exposure apparatus exposes a substrate to exposure light. The exposure apparatus includes a cleaning device which has a first supply port capable of supplying a plasma produced from a process gas, and cleans a member to be cleaned by bringing the plasma supplied from the first supply port into contact with the member to be cleaned. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2010093245(A) |
申请公布日期 |
2010.04.22 |
| 申请号 |
JP20090210447 |
申请日期 |
2009.09.11 |
| 申请人 |
NIKON CORP |
发明人 |
NAKANO KATSUSHI;HOSHIKA RYUICHI |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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| 主权项 |
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