发明名称 Method for determining position of material edges on or at mask for semiconductor production, involves carrying multiple different elements by mask, where elements are made of different materials
摘要 <p>The method involves carrying multiple different elements by a mask (2) and placing a coordinate measuring machine (1) into a measuring table. The elements are made of different materials. The position of two material edges is determined by a detection system.</p>
申请公布号 DE102008037465(A1) 申请公布日期 2010.04.22
申请号 DE20081037465 申请日期 2008.10.17
申请人 VISTEC SEMICONDUCTOR SYSTEMS GMBH 发明人 LASKE, FRANK;FRICKE, WOLFGANG
分类号 G01B11/03;G01B11/24 主分类号 G01B11/03
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