| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition method, a substrate holder and a film deposition system where a pin hole defect caused by dust produced in the film deposition system is suppressed. Ž<P>SOLUTION: In the film deposition method where a substrate held by a substrate holder is subjected to film deposition treatment within a chamber, a magnetic field is generated in the vicinity of the part to be held in the substrate held by the substrate holder within the chamber, and the dust within the chamber is attracted by magnets. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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