发明名称 |
THROUGH ELECTRODE SUBSTRATE, METHOD FOR MANUFACTURING THE THROUGH ELECTRODE SUBSTRATE, AND SEMICONDUCTOR DEVICE USING THE THROUGH ELECTRODE SUBSTRATE |
摘要 |
Disclosed is a through electrode substrate comprising a conduction part extended from the obverse surface of the substrate to the reverse surface of the substrate, the conduction part having improved electric characteristics. Also disclosed is a semiconductor device using the through electrode substrate. A through electrode substrate (100) comprises a substrate (102) having a through-hole (104) extended from the obverse surface of the substrate to the reverse surface of the substrate, and a conduction part (106) comprising a metal material filled into the through-hole (104). The conduction part (106) comprises at least a metal material having an area weighed average grain diameter of not less than 13 µm. Further, the conduction part (106) comprises a metal material having a grain diameter of not less than 29 µm. One end of the conduction part comprises a metal material having an area weighed average grain diameter of less than 13 µm, and the other end of the conduction part comprises at least a metal material having an area weighed average grain diameter of not less than 13µm. |
申请公布号 |
WO2010044315(A1) |
申请公布日期 |
2010.04.22 |
申请号 |
WO2009JP64886 |
申请日期 |
2009.08.26 |
申请人 |
DAI NIPPON PRINTING CO., LTD.;MAEKAWA SHINJI;SUZUKI MIYUKI |
发明人 |
MAEKAWA SHINJI;SUZUKI MIYUKI |
分类号 |
H01L21/3205;H01L21/288;H01L23/52;H01L25/065;H01L25/07;H01L25/18;H01L29/84;H05K1/11;H05K3/40 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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