发明名称 THROUGH ELECTRODE SUBSTRATE, METHOD FOR MANUFACTURING THE THROUGH ELECTRODE SUBSTRATE, AND SEMICONDUCTOR DEVICE USING THE THROUGH ELECTRODE SUBSTRATE
摘要 Disclosed is a through electrode substrate comprising a conduction part extended from the obverse surface of the substrate to the reverse surface of the substrate, the conduction part having improved electric characteristics.  Also disclosed is a semiconductor device using the through electrode substrate.  A through electrode substrate (100) comprises a substrate (102) having a through-hole (104) extended from the obverse surface of the substrate to the reverse surface of the substrate, and a conduction part (106) comprising a metal material filled into the through-hole (104).  The conduction part (106) comprises at least a metal material having an area weighed average grain diameter of not less than 13 µm.  Further, the conduction part (106) comprises a metal material having a grain diameter of not less than 29 µm.  One end of the conduction part comprises a metal material having an area weighed average grain diameter of less than 13 µm, and the other end of the conduction part comprises at least a metal material having an area weighed average grain diameter of not less than 13µm.
申请公布号 WO2010044315(A1) 申请公布日期 2010.04.22
申请号 WO2009JP64886 申请日期 2009.08.26
申请人 DAI NIPPON PRINTING CO., LTD.;MAEKAWA SHINJI;SUZUKI MIYUKI 发明人 MAEKAWA SHINJI;SUZUKI MIYUKI
分类号 H01L21/3205;H01L21/288;H01L23/52;H01L25/065;H01L25/07;H01L25/18;H01L29/84;H05K1/11;H05K3/40 主分类号 H01L21/3205
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