发明名称 PROJECTION EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a projection exposure method, in which a circuit pattern is formed at an accurate position even if relative position relation or an arrangement of respective reference marks deviates from a design value, and a decrease in throughput of manufacture of a printed circuit board is small. <P>SOLUTION: Area and exposure order of each exposure area are set by repeating, until the area of the exposure area becomes minimum, a step (S21) of computing each overlap error of a first exposure area at each exposure position before exposure, a step (S22) of determining whether an arithmetic result is less than an allowable value based upon a measurement result of the printed circuit board, a step (S23) of setting exposure using an exposure area at an exposure position where the arithmetic result is determined to be less than the allowable value, and a step (S24) of setting an exposure area obtained by dividing the exposure area at an exposition position where an arithmetic result is determined to be not less than the allowable value. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010093056(A) 申请公布日期 2010.04.22
申请号 JP20080261549 申请日期 2008.10.08
申请人 MEJIRO PRECISION:KK 发明人 MURAKAMI SHIGEO
分类号 H01L21/027;G03F9/00 主分类号 H01L21/027
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