发明名称 PLASMA DOPING APPARATUS
摘要 There are installed, on a surface of an window on a vacuum chamber side, an insulating side face portion, which extends radially from the center of a generating unit of a plasma generating device and is disposed so as to be orthogonal to a substrate mounting face of an electrode, and a conductive layer, which is made of a material identical to that for the substrate and placed in an area corresponding to the generating unit on the surface of the window on the vacuum chamber side.
申请公布号 US2010095889(A1) 申请公布日期 2010.04.22
申请号 US20090539949 申请日期 2009.08.12
申请人 KAI TAKAYUKI;OKUMURA TOMOHIRO;NAGAI HISAO 发明人 KAI TAKAYUKI;OKUMURA TOMOHIRO;NAGAI HISAO
分类号 C23C16/54 主分类号 C23C16/54
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