| 摘要 |
PURPOSE: A plasma processing unit, a deposition apparatus and a deposition method including the same are provided to obtain a desired plasma power according to external signal by installing a plasma splitter in the plasma processing unit. CONSTITUTION: A plurality of plasma electrodes(501, 502, 503, 504) is respectively arranged in a plurality of reaction spaces(170, 180, 190, 200). A first plasma processing unit(610) is connected to at least two plasma electrodes. A first plasma power is connected to the first plasma processing unit. The first plasma processing unit includes a plasma distributor or a plasma splitter. The plasma distributor includes a plurality of distribution circuits. |
