发明名称 IMAGE SENSOR AND METHOD FOR MANUFACTURING THEREOF
摘要 <p>PURPOSE: An image sensor and a method for manufacturing the same are provided to protect the saturation and the sensitivity of the image sensor from reducing by forming a passage for a photo-charge between a photodiode and a readout circuit. CONSTITUTION: A readout circuit(120) is formed on a first substrate(100). A first image sensor(110) is formed on the one side of the readout circuit. A wiring(150) is formed on the first substrate to be electrically connected to the readout circuit. A second image sensor(210) is formed on the wiring. The first floating diffusion region for the first image sensor and the second floating diffusion region for the second image sensor include a same potential.</p>
申请公布号 KR20100041407(A) 申请公布日期 2010.04.22
申请号 KR20080100574 申请日期 2008.10.14
申请人 DONGBU HITEK CO., LTD. 发明人 SHIM, HEE SUNG
分类号 H01L27/146;H01L27/14;H04N5/335;H04N5/357;H04N5/369 主分类号 H01L27/146
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