| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system and method for facilitating maintenance of an optical element in an immersion lithography apparatus, thereby lengthening a service life of the optical element. <P>SOLUTION: The immersion lithography apparatus incorporates a working stage arranged to retain a workpiece, a projection system for projecting a pattern image, a fluid supply unit for supplying an immersion liquid into a gap defined between an optical element of the projection system and the workpiece, and a cleaning device for cleaning the optical element during a cleaning process. <P>COPYRIGHT: (C)2010,JPO&INPIT |
