COMPOSITION AND METHOD FOR MANUFACTURING IT, POROUS MATERIAL AND METHOD FOR FORMING IT, INTERLAYER INSULATING FILM, SEMICONDUCTOR MATERIAL, SEMICONDUCTOR DEVICE, AND LOW-REFRACTIVE-INDEX SURFACE PROTECTIVE FILM

摘要

PROBLEM TO BE SOLVED: To provide a composition capable of producing a porous material having both low relative dielectric constant and high mechanical strength and excellent in storage stability, and to provide a method for manufacturing it.

SOLUTION: The composition includes a hydrolysate of an alkoxysilane compound, a hydrolysate of a siloxane compound represented by general formula (1), a surfactant, and an element having an electronegativity of 2.5 or less.

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