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发明名称
METHOD OF PROCESSING A HIGH-K DIELECTRIC FOR CET SCALING
摘要
申请公布号
EP2176879(A1)
申请公布日期
2010.04.21
申请号
EP20080771155
申请日期
2008.06.16
申请人
FREESCALE SEMICONDUCTOR, INC.
发明人
HEGDE, RAMA I.;SAMAVEDAM, SRIKANTH B.
分类号
H01L21/31;H01L21/336;H01L29/423;H01L29/78
主分类号
H01L21/31
代理机构
代理人
主权项
地址
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